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STANDARD PLASMA SYSTEMS

[ PLASMA SYSTEM FEMTO UHP - PLASMA ETCHER ]

1,9 litres laboratory plasma system FEMTO UHP (Ultra High Purity) with semi-automatic control is mainly used for:

small scale production
analysis (SEM, TEM)
medical technology
sterilisation
research and development
semiconductor technology
plastic technology

UHP stands for Ultra High Purity. This designation is used for the glass chambers of our plasma systems, which can be, depending upon customer's request, made from Borosilicate glass or Quartz glass. The option of UHP is available only for the following units:
Femto, Pico und Nano.

Glass chambers are used in microwave systems and/or with applications where ultra pure surfacing is necessary. Stainless steel or aluminum chambers can sputter in the smallest quantities, like all metals in a plasma system. For most processes this is not of importance and absolutely negligibly. The aluminum construction units from the UHP plant are coated with AL2O3.

The plasma system Pico UHP doesn't have a stainless steel chamber; thus, it is suitable for applications in which vestiges of chrome, nickel and iron are inconveniant.

Prospekt FEMTO (PDF 1007 KB)

All plasma systems can be combined in the most diverse variations. The following overview is a help to get an overview of the most usual plasma systems.

Technical Data: Plasma cleaner Femto UHP type A mit digital Timer

switchgear cabinet:
W 345 mm, H 211 mm, D 420 mm
chamber:
Ø 95 mm, L 270 mm, Opening Ø 90 mm
chamber volume:
approx. 1,9 litre
materials:
quartz or borosilicate glass front-and backside of the chamber: aluminium
gas supply:
one gas channel through needle valve
generator:
40 kHz/100W, infinitely variable
vacuum pump:
Pfeiffer Duo(2.5m³/h)
tray:
1 pc. tray
control:
semi-automatic control, process time
by timer
Timer:
H8GN

Plasma system FEMTO UHP typ A: Process development, cleaning, activating, etching
(small series)

options / accessories Price on request

Technical Data: Plasma cleaner Femto UHP type B (with door)

switchgear cabinet:
W 560 mm, H 310 mm, D 420/600 mm
chamber:
Ø 95 mm, L 270 mm, Opening Ø 90 mm
chamber volume:
approx. 1,9 litre
materials:
quartz or borosilicate glass front-and backside of the chamber: aluminium
gas supply:
one gas channel through needle valve
generator:
40 kHz/100W, infinitely variable
vacuum pump:
Pfeiffer Duo(2.5m³/h)
tray:
1 pc. tray
control:
semi-automatic control, process time
by timer
Timer:
Dilet

Plasma system FEMTO UHP typ B: Process development, cleaning, activating, etching
(small series)

options / accessories Price on request

Technical Data: Plasma cleaner Femto UHP type C

switchgear cabinet:
W 562 mm, H 211 mm, D 420 mm
chamber:
Ø 95 mm, L 270 mm, Opening Ø 90 mm
chamber volume:
approx. 1,9 litre
materials:
quartz or borosilicate glass front-and backside of the chamber: aluminium
gas supply:
2 gas channel through needle valve
generator:
40kHz/100 W, infinitely variable
vacuum pump:
Pfeiffer Duo(2.5m³/h)
tray:
1 pc. tray
control:
semi-automatic control, process time
Pressure sensor:
Pirani
Timer:
LT4H

Plasma system FEMTO UHP typ C: Process development, cleaning, activating, etching
(small series)

options / accessories Price on request

Technische Daten Plasma System Femto-PC UHP type D

switchgear cabinet:
W 500 mm, H 460 mm, D 550 mm
chamber:
Ø 95 mm, L 270 mm, Opening Ø 90 mm
chamber volume:
approx. 1,9 litre
materials:
quartz or borosilicate glass front-and backside of the chamber: aluminium
gas supply:
3 gas channel through MFC
generator:
40kHz/0-100 W
(option: 13,56 MHz or 2,45 GHz)
vacuum pump:
Pfeiffer Duo(2,5m³/h)
tray:
1 pc. tray
control:
PC control runs under Windows (To learn more about PC control, please refer to our pages.)

Kleinanlage FEMTO TYP E : Einsätzbar in der Prozessentwicklung zum Reinigung, Aktivierung, Ätzung in Kleinserie

Plasma system FEMTO-PC UHP typ D: Process development, cleaning, activating, etching
(small series)

options / accessories Price on request

Technical Data: Plasma cleaner Femto UHP type E

switchgear cabinet:
W 310 mm, H 570 mm, D 420 mm
chamber:
Ø 95 mm, L 270 mm, Opening Ø 90 mm
chamber volume:
approx. 1,9 litre
materials:
quartz or borosilicate glass front-and backside of the chamber: aluminium
gas supply:
2 gas channel through needle valve
generator:
40kHz/100 W, infinitely variable
vacuum pump:
Pfeiffer Duo(2.5m³/h)
tray:
1 pc. tray
control:
semi-automatic control, process time
Pressure sensor:
Pirani
Timer:
LT4H

Plasma system FEMTO UHP typ E: Process development, cleaning, activating, etching
(small series)

options / accessories Price on request

The mentioned prices are without obligation.
Please contact us if you have technical questions.