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Technical Data:
Plasma etcher NANO
switchgear cabinet:
W 580 mm, H 650 mm, D 500 mm
chamber:
Ø 267 mm, L 420 mm
chamber volume:
approx. 24 litres
gas supply:
two gas channels through needle valve
generator:
40kHz/300 W, infinitely variable
(optional: 13.56 MHz or 2.45 GHz)
vakuum pump:
Leybold, Type D8B (8 m³/h)
trays:
1 pc. tray
control:
semi-automatic, process time by timer
options / accessories
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Plasma system NANO with semi-automatic control:
cleaning, activating, etching, deposition of coatings
Plasma system NANO with fully automatic control:
cleaning, activating, etching, deposition of coatings |
